Composition for base, and directed self-assembly lithography method

A composition for a base of a directed self-assembling, the composition comprising:

• a compound comprising an oxo acid group;
• and
• a solvent,
• wherein the oxo acid group is a phosphoric acid group, a phosphono group, a sulfo group, a sulfuric acid group, a carboxy group, or a combination thereof,
• wherein the compound is represented by formula (1):
• AB)n (1)
• wherein, in the formula (1), A represents an organic group having 10 or more carbon atoms and having a valency of n;
• B represents the oxo acid group;
• and n is an integer of 1 to 200, wherein in a case where n is 2 or greater, a plurality of Bs are identical or different, and
• wherein when n is 1, A represents a polymer or a chain organic group, and the oxo group binds to an end of a main chain of the polymer or the chain organic group, and when n is an integer of 2 to 200, the compound is a copolymer comprising a first monomer unit which comprises the oxo group and a second monomer unit other than the first monomer unit, and an amount of the first monomer unit with respect to a total of monomer units in the copolymer is from 0.01 to 20 mol %.