Metallic oxide thin film transistor, array substrate and their manufacturing methods, display device
AssigneeBoe Technology Group Co., Ltd.
InventorsLei ZHAO, Wei GUO
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Abstract
The present invention provides a metallic oxide thin film transistor and its manufacturing method, an array substrate and its manufacturing method, as well as a display device, which is belong to the field of thin film transistor manufacturing technology. The method for manufacturing the metallic oxide thin film transistor comprises a step of forming patterns of an oxide active layer and an etch stopping layer through a one-time patterning process.
Claims20
A method for manufacturing a metallic oxide thin film transistor, comprising a step of forming patterns of an oxide active layer and an etch stopping layer through a one-time patterning process.
Dependencies are inferred from the claim text.