System for wet etching

Abstract

A system for wet etching. The system comprises an etching region, a buffer region and a washing region which are communicated in order. An air knife unit is provided at a position at which the buffer region and the clean region connects. The system further comprises a cleaning unit, which is provided correspondingly to the air knife unit, and is used for cleaning the air knife unit. The system efficiently removes the etchant crystal and dust particles attached to the knife edge and periphery of the air knife by means of the cleaning unit. The system can replace the manual cleaning of the air knife, improve operation rate of the device, and reduce waste of labor power as much as possible while ensuring the cleaning effect, while meanwhile avoiding increased particles that would otherwise affect the product yield as a result of lengthy openings of the device cavity.

Dependencies are inferred from the claim text.