Mask for deposition system and method for using the mask

A deposition system, comprising:

• a plurality of deposition chambers;
• and
• a patterned mask dedicated to each of the deposition chambers, wherein:
• a first mask of the patterned masks has a first opening formed therethrough outside of a pattern formed thereon;
• a second mask of the patterned masks has a first opening formed therethrough outside of a pattern formed thereon, the first opening of the second mask having a position on the second mask that is different than a position of the first opening on the first mask;
• and
• a third mask of the patterned masks has a first opening formed therethrough outside of a pattern formed thereon, the first opening of the third mask having a position on the third mask that is different than the positions of the first openings of the first and second masks.

A method for forming a plurality of film layers on a substrate, comprising:

• inserting the substrate into a deposition system comprising a plurality of chambers, each chamber having a patterned mask disposed therein;
• depositing a first film layer on the substrate in a first chamber using a first patterned mask, wherein a portion of the film layer is deposited outside of a pattern of the patterned mask;
• transferring the substrate to a second chamber;
• and
• monitoring the portion of the film layer that is deposited outside of the pattern of the patterned mask.