Vacuum evaporation device and vacuum evaporation method

A vacuum evaporation method, comprising:

• moving, by a substrate driving mechanism, a sub-region on the substrate to be above a first mask plate;
• aligning, by an alignment mechanism, a first alignment mark on the substrate with a second alignment mark on the first mask plate and a third alignment mark on a second mask plate through adjusting positions of the first mask plate and the second mask plate by a first mask plate driving mechanism and a second mask plate driving mechanism, respectively;
• and
• turning on an evaporation source, so that a material is vaporized and moves upward until it reaches a surface of the substrate and the vaporized material is deposited on the substrate to form a film with a pattern identical to an effective aperture pattern at an effective mask plate pattern region formed after the first mask plate overlaps the second mask plate.