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US 2016/0354871 A1Published application
Flux and method for manufacturing semiconductor device
AssigneeFujitsu Limited
InventorsKOZO SHIMIZU, Seiki Sakuyama, Nobuhiro Imaizumi
Life of this patent
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Abstract
A flux includes: a first glycol-based polyhydric alcohol having a molecular weight of 300 or less; and a second glycol-based polyhydric alcohol having a molecular weight of 600 or more.
Claims15
A flux comprising:
- a first glycol-based polyhydric alcohol having a molecular weight of 300 or less;
- and
- a second glycol-based polyhydric alcohol having a molecular weight of 600 or more.
A method for manufacturing a semiconductor device, comprising:
- preparing a semiconductor chip or a semiconductor package and a circuit board;
- and
- bonding the semiconductor chip or the semiconductor package with the circuit board by reflowing an SnAg based solder using a flux which contains a first glycol-based polyhydric alcohol having a molecular weight of 300 or less and a second glycol-based polyhydric alcohol having a molecular weight of 600 or more.
Dependencies are inferred from the claim text.