Array substrate, manufacturing method and display device
AssigneesBoe Technology Group Co., Ltd., Beijing Boe Optoelectronics Technology Co., Ltd.
InventorQIYU SHEN
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Abstract
A method for manufacturing an array substrate comprising: using a mask plate (4), and controlling exposure energy to obtain a first exposure feature size, so as to form a gate metal layer on the array substrate; and using the mask plate again, and controlling exposure energy to obtain a second exposure feature size larger than a size of the gate metal layer, so as to form low doped regions (8) located at opposite sides of the gate metal layer and having a same length. The method can form the two low doped regions of the LTPS-TFT having the same length and guarantee the ability of the LTPS-TFT to suppress the leakage current.
Claims7
A method for manufacturing an array substrate, comprising:
- forming a first insulation layer on the array substrate;
- forming an amorphous silicon layer on the first insulation layer, and performing a laser annealing process to form a poly-silicon layer;
- forming silicon islands of the poly-silicon layer by a first patterning process;
- using a mask plate to form a gate metal layer on the array substrate;
- and
- using the mask plate again, and controlling exposure energy to obtain a exposure feature size larger than a size of the gate metal layer, so as to form low doped regions located at opposite sides of the gate metal layer and having a same length in the silicon islands.
(canceled)
5-8. (canceled)
10-13. (canceled)
Dependencies are inferred from the claim text.