Non-volatile memory device and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJae-Jin SHIN, Kyung-Hyun KIM, Jung-Hun NO, Choong-Kee SEONG, Seung-Pil CHUNG, Jung-Geun JEE
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AssigneeSamsung Electronics Co., Ltd.
InventorsJae-Jin SHIN, Kyung-Hyun KIM, Jung-Hun NO, Choong-Kee SEONG, Seung-Pil CHUNG, Jung-Geun JEE
Estimating the term…
A preliminary tunnel insulation pattern and a preliminary charge storage pattern are formed on each active pattern extending in a direction, and a trench is defined between structures including the active pattern, the preliminary tunnel insulation pattern and the preliminary charge storage pattern. A preliminary isolation pattern partially fills the trench. A dielectric layer and a control gate electrode layer are formed on the preliminary charge storage pattern and the preliminary isolation pattern. The control gate electrode layer, the dielectric layer, the preliminary charge storage pattern and the preliminary tunnel insulation pattern are patterned to form gate structures including a tunnel insulation pattern, a charge storage pattern, a dielectric layer pattern and a control gate electrode. The preliminary isolation pattern is isotropically etched to form an isolation pattern and a first air gap. An insulating interlayer is formed between the gate structures to keep the first air gap.
A method of manufacturing a non-volatile memory device, the method comprising:
-15. (canceled)
A method of manufacturing a non-volatile memory device, the method comprising:
Dependencies are inferred from the claim text.