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US 2016/0260614 A1Published application
Method for preparing film patterns
AssigneesBoe Technology Group Co., Ltd., Chengdu Boe Optoelectronics Technology Co., Ltd.
InventorsYuqing YANG, Seung Yik PARK, Byung Chun LEE
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Abstract
A method for preparing film patterns; firstly, a complementary film pattern (1) to a desired film pattern (201) is prepared on a substrate (3) with an erasable agent; secondly, a whole layer of film (2) is formed on the complementary film pattern (1); and thirdly, the desired film pattern (201) is obtained by removing the complementary film pattern (1). The preparation method can simplify the production process and reduce the production cost of the film patterns.
Claims16
A method for preparing film patterns, comprising:
- forming a first film pattern on a substrate with an erasable agent;
- preparing a second film on the substrate provided with the first film pattern;
- and
- removing the first film pattern on the substrate and an area of the second film covering the first film pattern and obtaining a second film pattern complementary to the first film pattern.
1 more element
Dependencies are inferred from the claim text.