Plasma processing apparatus

A plasma processing apparatus for performing a plasma processing on an object to be processed (“workpiece”), the plasma processing apparatus comprising:

• a processing container;
• a placement table provided within the processing container and including a placement region on which the workpiece is placed;
• a baffle structure interposed between the placement table and the processing container at a location below the placement region to define a first space in which the placement region is disposed and a second space below the placement region, the baffle structure including:
• a first member that includes a cylindrical portion extending between the placement table and the processing container, a plurality of vertically elongated through holes being formed to be arranged in a circumferential direction, and
• at least one second member disposed in an outside of the cylindrical portion of the first member in a radial direction, the second member being configured to be arranged to form a cylindrical body having an inner diameter larger than an outer diameter of the cylindrical portion;
• a gas supply portion connected to the first space;
• an exhaust apparatus connected to the second space;
• and
• a driving mechanism configured to:
• move the at least one second member in a vertical direction, individually move a plurality of circumferential areas of the cylindrical body in the vertical direction, and move the at least one member in the radial direction, or make the at least one second member inclined with respect to the vertical direction.