Electron beam generator, image apparatus including the same and optical apparatus

An image apparatus comprising:

• an electron beam generator configured to provide an electron beam on a substrate;
• a detector configured to detect secondary electrons generated from the substrate using the electron beam;
• and
• a control unit configured to control the electron beam generator and obtain a substrate image according to a detection signal of the detector,
• wherein the electron beam generator comprises:
• a source supply unit configured to provide a beam source to the substrate;
• a first laser apparatus configured to provide a first laser beam to the beam source and the substrate;
• a first optical system having a focal point on the substrate and configured to concentrate the first laser beam on the substrate;
• and
• a second laser apparatus configured to provide a second laser beam overlapping the first laser beam between the first optical system and the first laser apparatus;
• wherein the second laser apparatus outputs the second laser beam which has a phase opposite to a phase of the first laser beam, and decreases a first spot size of an interference beam generated by a destructive interference with the first laser beam to be smaller than a wavelength of the first laser beam at the focal point.

An optical apparatus comprising:

• first and second laser apparatuses configured to provide first and second laser beams to a substrate;
• and
• a first optical system provided between the first and second laser apparatuses and the substrate, and configured to focus the first and second laser beams,
• wherein the first and second laser beams are overlapped with each other to generate an interference beam, and decrease a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point of the first optical system.