Multi-layer dielectric film with nanostructured block copolymer
AssigneeCooper Technologies Company
InventorsShireesh Pankaj, JAVED ABDURRAZZAQ MAPKAR, CHAO LI, STEPHEN JOHN RIGBY
Life of this patent
Estimating the term…
Abstract
The disclosed concept relates to multi-layer dielectric film with nano- or micro-structured block copolymers, such as, but not limited to, di-block copolymers and tri-block copolymers, and, more particularly, to capacitors constructed from the film. More particularly, the disclosed concept provides the ability to tune or control one or more characteristics of the dielectric film and capacitors formed therefrom, by selecting and combining blocks that exhibit different electrical and/or mechanical properties.
Claims20
A dielectric film, comprising:
- a block copolymer having at least two different blocks,
- wherein each of the at least two different blocks self-assemble to form alternating layers within the dielectric film.
A method of preparing a film capacitor, comprising:
- obtaining a block copolymer having at least two different blocks;
- allowing the at least two different blocks to self-assemble forming alternating layers in a thin film dielectric;
- and
- rolling the thin film dielectric and a metal layer forming a capacitor in a rolled-up configuration.
Dependencies are inferred from the claim text.