Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
AssigneeNikon Corporation
InventorYuichi SHIBAZAKI
Life of this patent
Estimating the term…
Loading patent…
AssigneeNikon Corporation
InventorYuichi SHIBAZAKI
Estimating the term…
An exposure apparatus exposes a substrate with illumination light via an optical system. A stage disposed below the optical system has a holder to hold the substrate. A carrier system disposed above the stage has a first support member that supports the substrate in a noncontact manner from a surface side of the substrate, which is irradiated with the illumination light. A second support member different from the first support member supports the substrate in a contact manner from a rear surface side. A drive system coupled to the first and the second support members moves at least the second support member so that relative movement between the first and the second support members and relative movement between the second support member and the holder are performed at least in a vertical direction. The second support member carries the substrate from the first support member to the holder.
An exposure apparatus that exposes a substrate with illumination light via an optical system, the apparatus comprising:
An exposure method of exposing a substrate with illumination light via an optical system, the method comprising:
A method of making an exposure apparatus that exposes a substrate with illumination light via an optical system, the method comprising:
Dependencies are inferred from the claim text.