US 2016/0259247 A1Published application

Composition for forming a resist underlayer film, and pattern-forming method

AssigneeJsr Corporation

InventorsFumihiro TOYOKAWA, Shin-ya NAKAFUJI, Gouji WAKAMATSU

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Abstract

A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

A composition comprising:
a calixarene-based compound represented by formula (3);
and
an organic solvent,
wherein in the formula (3), R represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms, and at least part of a part of R is the monovalent organic group;
m is an integer of 4 to 12;
Y represents a hydrocarbon group having 1 to 10 carbon atoms;
q is an integer of 0 to 7;
p is an integer of 1 to 3, wherein a sum of p and g is no less than 1 and no greater than 8;
and k is 0 or 1;
X represents a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms or a hydrogen atom, wherein a plurality of Rs are identical or different, a plurality of Xs are identical or different, a plurality of “k”s are identical or different, a plurality of “p”s are identical or different, and a plurality of “q”s are identical or different, and wherein in a case where Y is present in a plurality of number, a plurality of Ys are identical or different,
wherein, in a case where p is 2,
X is a phenyl group substituted with —OR;
or
the monovalent organic group represented by R is at least one group selected from the group consisting of a benzyl group, a cyclopentyl group, a group comprising a polymerizable carbon-carbon triple bond, a group comprising an epoxy group, a group comprising an alkoxymethyl group, a group comprising a formyl group, a group comprising an acetyl group, a group comprising a dialkylaminomethyl group, a group comprising a dimethylolaminomethyl group, a group represented by formula (a), a group represented by formula (b), and group represented by formula (c):
wherein Ra and Ra′ each independently represent a single bond or an alkanediyl group having 1 to 10 carbon atoms:
Ra″ represents a single bond, an alkanediyl group, a hydroxyalkanediyloxy group or (R″O)i;
R″ represents an alkanediyl group:
“i” is an integer of 1 to 10;
Rb″ represents a hydrogen atom;
and Rb, Rb′, Rc, Rc′, Rc″, Rd, Rd′ and Rd″ each independently represent a hydrogen atom or a monovalent hydrocarbon group.

18 more elements

Facts

Application

15/159,054Filed 19 May 2016

Priority

JP 2012-19883710 Sep 2012

Published

8 Sep 2016

Term ends

Not estimatedThe source records don’t support an estimate.

Classification23 codes

G03F 7/11
Characterised by structural details, e.g. supports, auxiliary layers: having cover layers or intermediate layers, e.g. subbing layers
C07C 217/18
The oxygen atom of the etherified hydroxy group being further bound to a carbon atom of a six-membered aromatic ring: the six-membered aromatic…
C07C 279/08
Having nitrogen atoms of guanidine groups bound to acyclic carbon atoms of a carbon skeleton: being further substituted by singly-bound oxygen atoms
C08G 8/04
Condensation polymers of aldehydes or ketones with phenols only: of aldehydes

Abstract

Claims18