Barrier anodization methods to develop aluminum oxide layer for plasma equipment components
OwnerYogita PAREEK, Ankur KADAM +3inventors
InventorsYogita PAREEK, Ankur KADAM, Laksheswar KALITA, Bipin THAKUR, Dmitry LUBOMIRSKY
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Abstract
The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes an aluminum body having an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a film density higher than 3.1 g/cm−2.
Claims20
A chamber component, for use in a plasma processing apparatus, comprising:
- an aluminum body having an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a film density higher than 3.1 g/cm−2.
An apparatus for use in a plasma processing chamber having a substrate pedestal adapted to support a substrate, comprising:
- a chamber component having an aluminum body with an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a surface roughness less than 16 Ra.
A method for fabricating a chamber component for use in a plasma processing environment, comprising:
- immersing a body of the chamber component from aluminum into an electrolyte solution including at least one ammonium salt;
- controlling a pH level of the electrolyte solution around neutral;
- applying a voltage to the electrolyte solution;
- and
- forming an anodizing coating on the body.
Dependencies are inferred from the claim text.