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US 2016/0258048 A1Published application
Method and system for forming a patterned metal film on a substrate
AssigneeOrelTech Ltd.
InventorNatalia ZAMOSHCHIK
Life of this patent
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Abstract
A method and system for forming a thin patterned metal film on a substrate are presented. The method includes applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters.
Claims38
A method for forming a thin patterned metal film on a substrate, comprising:
- applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations;
- and
- exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters.
A machine for forming a thin patterned metal film on a substrate, comprising:
- a container adapted to contain an ink composition, wherein the ink composition includes at least metal cations;
- a nozzle adapted to apply the ink composition on a pre-treated surface of the substrate;
- a plasma applicator adapted to expose at least the ink composition applied on the substrate to a low-energy plasma operated according to a first set of exposure parameters;
- and
- a controller configured to control the operation of the nozzle and the plasma applicator.
2 more elements
Dependencies are inferred from the claim text.