Substrate processing apparatus and hand shower gun

A substrate processing apparatus comprising:

• a chamber for processing a substrate;
• a washing unit that performs washing an inside of the chamber;
• and
• a liquid supplying line that supplies liquid to the washing unit, wherein
• the washing unit includes:
• a main body that has a liquid supplying port and a liquid jetting port;
• a flow channel that is formed between the liquid supplying port and the liquid jetting port in the main body;
• and
• a valve that is provided in the flow channel,
• in the washing unit, when the valve is opened, the flow channel is opened, thereby causing the liquid jetting port to jet liquid, and when the valve is closed, the flow channel is closed, thereby causing the liquid jetting port to stop jetting liquid, and
• the liquid supplying line is provided with a water-hammer reducing mechanism that operates to reduce damage to the flow channel caused by a water hammer phenomenon when the valve is closed.

A hand shower gun comprising:

• a main body that has a liquid supplying port and a liquid jetting port;
• a flow channel that is formed between the liquid supplying port and the liquid jetting port in the main body;
• a valve that is provided in the flow channel;
• and
• an operation handle that opens/closes the valve, wherein
• when the valve is opened by an opening operation of the operation handle, the flow channel is opened, thereby causing the liquid jetting port to jet liquid, and when the valve is closed by a closing operation of the operation handle, the flow channel is closed, thereby causing the liquid jetting port to stop jetting liquid, and
• the flow channel in the main body is provided with a water-hammer reducing mechanism that operates when the valve is closed by the closing operation of the operation handle.