Extreme ultraviolet light source

A method of generating extreme ultraviolet (EUV) light, the method comprising:

• providing a target to a target location, the target comprising target material that emits EUV light when in a plasma state, the target having an extent in a first direction of 200 nanometers (nm) or less and an extent in a second direction of 300 micrometers (μm) or more;
• and
• directing radiation toward the target location to interact the radiation with the target, the radiation comprising a first portion and a second portion, the second portion reaching the target location after the first portion, the radiation propagating in a direction that is parallel to the first direction at the target location, wherein
• interacting the first portion of the radiation with the target forms a modified target, the modified target having a lower density than the target, and
• interacting the second portion of the radiation with the modified target converts at least some of the target material in the modified target to the plasma that emits EUV light.