Precision batch production method for manufacturing ferrite rods
AssigneeKoninklijke Philips N.V.
InventorJohn Brean Mills
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Abstract
The present invention relates to a method of manufacturing a ferrite rod. The method comprises etching cavities into two semiconductor substrates and depositing ferrite layers into the cavities. The semiconductor substrates are attached to each other such that the ferriote layers form a ferrite rod. The present invention employs conventional photolithography and bulk isotropic micromachining of semiconductor wafers to precisely and repeatably form a template or mould, into which magnetic material can be deposited to form a Faraday rotation or phase-shifting element.
Claims18
A method of manufacturing a ferrite rod, the method comprising the steps of:
- etching a first cavity into a first surface of a first semiconductor substrate;
- depositing a first ferrite layer into the first cavity;
- etching a second cavity into a second surface of a second semiconductor substrate;
- depositing a second ferrite layer into the second cavity;
- attaching the first surface of the first semiconductor substrate to the second surface of the second semiconductor substrate such that the first ferrite layer contacts the second ferrite layer.
A ferrite rod comprising:
- a first ferrite layer and a second ferrite layer;
- wherein the ferrite rod further comprises a passivation layer arranged between said first ferrite layer and said second ferrite layer.
An electronic device comprising:
- a semiconductor substrate;
- and
- a ferrite rod;
- wherein the ferrite rod is integrated in the semiconductor substrate.
Dependencies are inferred from the claim text.