Array substrate and manufacturing method thereof, display device

An array substrate, comprising:

• a gate line, a data line, a common electrode line, a thin film transistor comprising a source electrode, a drain electrode and an active layer, a first transparent electrode formed on a substrate;
• a passivation layer and a second transparent electrode formed over the first transparent electrode;
• an insulating interlayer formed between the active layer of the thin film transistor and a layer where the first transparent electrode is located;
• a first via hole formed in the insulating interlayer;
• and
• a second via hole formed in the passivation layer;
• wherein the first transparent electrode is connected with the drain electrode of the thin film transistor through the first via hole, the second transparent electrode is connected with the common electrode line through the second via hole;
• or the first transparent electrode is connected with the common electrode line through the first via hole, the second transparent electrode is connected with the drain electrode of the thin film transistor through the second via hole.

An array substrate, comprising:

• a gate line, a data line, a common electrode line, a thin film transistor comprising a source electrode, a drain electrode and an active layer, a first transparent electrode formed on a substrate;
• a passivation layer and a second transparent electrode formed over the first transparent electrode;
• an insulating interlayer formed between the active layer of the thin film transistor and a layer where the first transparent electrode is located;
• and
• a via hole formed over the common electrode line, which passes through the insulating interlayer and the passivation layer;
• wherein the first transparent electrode is located between the gate insulating layer, the drain electrode and the passivation layer, and is connected with the drain electrode, and the second transparent electrode is connected with the common electrode line through the via hole.