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US 2016/0254173 A1Published application
Spatially limited processing of a substrate
OwnerOscar EDGERLY, Gregory KNIGHT +1inventors
InventorsOscar EDGERLY, Gregory KNIGHT, Michael BERGMAN
Life of this patent
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Abstract
A method of chemical processing includes passing a substrate material from a first transfer conveyor device to a second transfer conveyor device across a fluid reservoir so that a first surface of the substrate contacts a fluid within the reservoir and a second surface of the substrate is substantially untouched by the fluid within the reservoir and the first and second transfer conveyor devices are placed substantially outside of the reservoir.
Claims21
A chemical processing device comprising:
- a reservoir having a first edge and a second edge;
- a first conveyor device disposed adjacent to said first edge;
- a second conveyor device disposed adjacent to said second edge such that said first and second edges are disposed between said first and second conveyor devices, said second conveyor device being adapted to receive and support a substrate material from said first conveyor device, whereby one surface of said substrate material contacts a fluid material disposed within said reservoir during a transition from said first conveyor device to said second conveyor device while a further surface of said substrate material remains substantially un-contacted by said fluid material.
A chemical processing system comprising:
- a reservoir having a reservoir longitudinal axis;
- a first conveyor device;
- and
- a second conveyor device, said first and second conveyor devices being disposed adjacent to, and on respective opposite sides of, said reservoir, and arranged such that, during operation, a work in process element can pass from said first conveyor device across said reservoir to said second conveyor device, whereby a lower surface region of said work in process element comes into contact with a fluid material supported by said reservoir while leaving an upper surface of said work in process element substantially out of contact of said fluid material.
1 more element
A chemical processing system comprising:
- a plurality of reservoirs, each reservoir of said plurality of reservoirs having a respective reservoir longitudinal axes;
- a first conveyor device;
- and
- a second conveyor device, said first and second conveyor devices being disposed adjacent to, and on respective opposite sides of one reservoir of said plurality of reservoirs, and arranged such that, during operation, a work in process element can pass from said first conveyor device across said one reservoir's longitudinal axis to said second conveyor device, whereby a lower surface region of said work in process element comes into contact with a first fluid material supported by said one reservoir while leaving an upper surface of said work in process element substantially out of contact of said first fluid material and wherein said one reservoir includes a recapture gutter, said recapture gutter structured and arranged to receive a portion of said first fluid material after said first fluid material flows through an aperture of said one reservoir, and wherein said one reservoir and the other reservoirs of said plurality of reservoirs are rapidly reconfigurable and arranged to receive alternative fluid materials.
1 more element
Dependencies are inferred from the claim text.