Exposure apparatus, exposure method, and method for producing device

A liquid immersion exposure apparatus comprising:

• a projection system;
• an immersion area forming member provided with an opening through which an exposure beam is projected, the immersion area forming member having a first liquid supply inlet facing downwardly, a second liquid supply inlet facing toward a path of the exposure beam, and a liquid recovery outlet facing downwardly;
• a substrate stage system having a first substrate holding member by which a substrate is held, the substrate stage system moving the substrate held by the first substrate holding member below and relative to the projection system and the immersion area forming member;
• a first temperature adjustment system which performs temperature adjustment for the first substrate holding member, a part of the first temperature adjustment system being provided at the first substrate holding member;
• and
• a controller which controls the first temperature adjustment system,
• wherein during exposure, a liquid immersion area is formed on a portion of an upper surface of the substrate held by the first substrate holding member while supplying a temperature-adjusted liquid from the first liquid supply inlet and collecting the supplied liquid from the liquid recovery outlet,
• wherein during the exposure, the substrate held by the first substrate holding member is exposed with the exposure beam through the liquid immersion area, and
• wherein during the exposure, liquid supplied from the second liquid supply inlet is allowed to flow through the opening to a gap between the immersion area forming member and the substrate and the liquid supplied from the second liquid supply inlet to the gap is collected from the liquid recovery outlet.