Loading patent…
AssigneeSemilab SDI LLC
InventorsDmitriy Marinskiy, Thye Chong Loy, Jacek Lagowski, Sung-Li Wang, Lin-Jung Wu, Shyh-Shin Ferng, Yi-Hung Lin, Sheng-Shin Lin
Estimating the term…
An example semiconductor wafer includes a semiconductor layer, a dielectric layer disposed on the semiconductor layer, and a layer of the metal disposed on the dielectric layer. An example method of determining an effective work function of a metal on the semiconductor wafer includes determining a surface barrier voltage of the semiconductor wafer, and determining a metal effective work function of the semiconductor wafer based, at least in part, on the surface barrier voltage.
A method of determining an effective work function of a metal on a semiconductor wafer, the semiconductor wafer comprising a semiconductor layer, a dielectric layer disposed on the semiconductor layer, and a layer of the metal disposed on the dielectric layer, the method comprising:
The method of claim 2, where determining the surface barrier voltage of the semiconductor wafer comprises:
A system comprising:
Dependencies are inferred from the claim text.