Nitride semiconductor ultraviolet light-emitting element

A method of manufacturing a nitride semiconductor ultraviolet light-emitting element comprising:

• a step of growing an AlN layer as an AlN crystal directly on a (0001) surface of a sapphire (0001) substrate and forming an underlying structure portion including the substrate and the AlN layer;
• and
• a step of forming a light-emitting element structure portion on a crystal surface of the underlying structure portion, the light-emitting element structure portion including an n-type cladding layer of an n-type AlGaN based semiconductor layer, an active layer having an AlGaN based semiconductor layer, and a p-type cladding layer of a p-type AlGaN based semiconductor layer;
• wherein the (0001) surface of the substrate is inclined at an off angle which is equal to or greater than 0.6° and is equal to or smaller than 3.0°;
• and
• an AlN molar fraction of the n-type cladding layer is equal to or higher than 50%.