US 2016/0240401 A1Published application

Substrate processing apparatus, substrate processing system, and substrate processing method

AssigneeSCREEN Holdings Co., Ltd.

InventorsRyo MURAMOTO, Mitsukazu TAKAHASHI

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Abstract

A top plate when located at a first position is held by an opposing-member holder, and the top plate when located at a second position is held by a substrate holder and rotated along with the substrate holder. In a substrate processing apparatus, a first processing liquid nozzle located at a supply position inside a to-be-held part of the top plate supplies a first processing liquid through an opposing-member opening to a substrate and is moved from the supply position to its retracted position, and a second processing liquid nozzle is moved from its retracted position to the supply position and supplies a second processing liquid through the opposing-member opening to the substrate. This configuration suppresses or prevents mixture of multiple types of processing liquids, as compared with the case where multiple types of processing liquids are sequentially supplied from a single processing liquid nozzle.

Claims39

Dependent claims

A substrate processing apparatus for processing a substrate, comprising:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate and has an opposing-member opening in a central part;
an opposing-member conveying mechanism for holding said opposing member and moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;
a first processing liquid supply part for supplying a first processing liquid through a first processing liquid nozzle to said upper surface of said substrate;
a second processing liquid supply part for supplying a second processing liquid through a second processing liquid nozzle to said upper surface of said substrate;
a nozzle moving mechanism for individually moving said first processing liquid nozzle and said second processing liquid nozzle, specifically, moving said first processing liquid nozzle between a supply position above said opposing-member opening and a first retracted position around said substrate holder and moving said second processing liquid nozzle between said supply position and a second retracted position around said substrate holder;
a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction;
a controller for controlling said first processing liquid supply part, said second processing liquid supply part, and said nozzle moving mechanism;
and
a gas supply part for supplying a gas to a space between said opposing member and said substrate,
wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism, and
under the control of said controller, said first processing liquid is supplied through said opposing-member opening to said substrate with said first processing liquid nozzle being located at said supply position, said first processing liquid nozzle is moved from said supply position to said first retracted position, said second processing liquid nozzle is moved from said second retracted position to said supply position, and said second processing liquid is supplied through said opposing-member opening to said substrate.

9 more elements

A substrate processing apparatus for processing a substrate, comprising:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate, has an opposing-member opening in a central part, and has a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening;
an opposing-member conveying mechanism for holding said to-be-held part of said opposing member and moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;
a processing liquid nozzle located on the inner side of said to-be-held part and for ejecting a processing liquid through said opposing-member opening toward said upper surface of said substrate;
a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction;
and
a gas supply part for supplying a gas to a space between said opposing member and said substrate,
said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism, and
said gas supply part supplies a gas to a gap between an inner surface of said to-be-held part of said opposing member and an outer surface of said processing liquid nozzle.

6 more elements

A substrate processing apparatus for processing a substrate, comprising:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate, has an opposing-member opening in a central part, and has a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening;
an opposing-member holder for holding said to-be-held part of said opposing member;
an opposing-member elevating mechanism for moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;
a processing liquid nozzle located on the inner side of said to-be-held part and for ejecting a processing liquid through said opposing-member opening toward said upper surface of said substrate;
a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction;
and
an opposing-member-holder moving mechanism for moving said opposing-member holder between a holding position above said opposing member and a retracted position around said opposing member,
wherein said opposing member that is located at said first position is held by said opposing-member holder and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,
said to-be-held part includes:
a cylindrical flange connector centered on said central axis;
and
an opposing-member flange part that extends radially outward from an upper end of said flange connector,
said opposing-member holder includes:
a first flange supporter that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;
a second flange supporter that is located on the opposite side to said first flange supporter with said flange connector located therebetween and that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;
and
a holder body on which said first flange supporter and said second flange supporter are mounted, and
with said opposing member being located at said second position, said first flange supporter and said second flange supporter are horizontally moved to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part or to dispose said first flange supporter and said second flange supporter below said opposing-member flange part.

16 more elements

A substrate processing apparatus for processing a substrate, comprising:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate;
a processing liquid supply part for supplying a processing liquid to said upper surface of said substrate;
a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in an up-down direction;
an opposing-member storage part capable of housing said opposing member;
and
an opposing-member conveying mechanism for holding said opposing member, moving said opposing member relative to said substrate holder between a first position and a second position in said up-down direction, and conveying said opposing member between a position above said substrate holder and said opposing-member storage part,
wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism, and
said opposing-member conveying mechanism conveys said opposing member from the position above said substrate holder into said opposing-member storage part and conveys another opposing member housed in said opposing-member storage part out of said opposing-member storage part to the position above said substrate holder.

6 more elements

A substrate processing method of processing a substrate with a substrate processing apparatus that comprises:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate and has an opposing-member opening in a central part;
an opposing-member conveying mechanism for holding said opposing member and moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;
a first processing liquid supply part for supplying a first processing liquid through a first processing liquid nozzle to said upper surface of said substrate;
a second processing liquid supply part for supplying a second processing liquid through a second processing liquid nozzle to said upper surface of said substrate;
a nozzle moving mechanism for individually moving said first processing liquid nozzle and said second processing liquid nozzle, specifically, moving said first processing liquid nozzle between a supply position above said opposing-member opening and a first retracted position around said substrate holder and moving said second processing liquid nozzle between said supply position and a second retracted position around said substrate holder;
a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction;
and a gas supply part for supplying a gas to a space between said opposing member and said substrate, wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,
said substrate processing method comprising:
a) moving said opposing member from said first position to said second position;
b) supplying said first processing liquid from said first processing liquid nozzle that is located at said supply position through said opposing-member opening to said substrate;
c) moving said first processing liquid nozzle from said supply position to said first retracted position;
d) moving said second processing liquid nozzle from said second retracted position to said supply position;
and
e) supplying said second processing liquid through said opposing-member opening to said substrate.

12 more elements

A substrate processing method of processing a substrate with a substrate processing apparatus that comprises:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate, has an opposing-member opening in a central part, and has a tubular to-be-held part that protrudes upward from the periphery of said opposing-member opening;
an opposing-member holder for holding said to-be-held part of said opposing member;
an opposing-member elevating mechanism for moving said opposing member relative to said substrate holder between a first position and a second position in an up-down direction;
a processing liquid nozzle located on the inner side of said to-be-held part and for ejecting a processing liquid through said opposing-member opening toward said upper surface of said substrate;
and a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction,
said substrate processing apparatus further comprising:
an opposing-member-holder moving mechanism for moving said opposing-member holder between a holding position above said opposing member and a retracted position around said opposing member,
wherein said opposing member that is located at said first position is held by said opposing-member holder and spaced above from said substrate holder, and said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,
said to-be-held part includes:
a cylindrical flange connector centered on said central axis;
and
an opposing-member flange part that extends radially outward from an upper end of said flange connector,
said opposing-member holder includes:
a first flange supporter that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;
a second flange supporter that is located on the opposite side to said first flange supporter with said flange connector located therebetween and that is in contact with and supports part of said opposing-member flange part of said opposing member from the underside when said opposing member is located at said first position;
and
a holder body on which said first flange supporter and said second flange supporter are mounted,
said substrate processing method comprising:
a) moving said opposing member from said first position to said second position;
b) start rotation of said substrate, said substrate holder, and said opposing member;
c) horizontally moving said first flange supporter and said second flange supporter to space said first flange supporter and said second flange supporter radially outward from said opposing-member flange part;
d) supplying said processing liquid from said processing liquid nozzle to said substrate;
e) horizontally moving said first flange supporter and said second flange supporter to dispose said first flange supporter and said second flange supporter below said opposing-member flange part;
f) stopping the rotation of said substrate, said substrate holder, and said opposing member;
and
g) moving said opposing member from said second position to said first position.

24 more elements

A substrate processing method of processing a substrate with a substrate processing apparatus that comprises:

a substrate holder for holding a substrate in a horizontal position;
an opposing member that opposes an upper surface of said substrate;
a processing liquid supply part for supplying a processing liquid to said upper surface of said substrate;
and a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in an up-down direction,
said substrate processing apparatus further comprising:
an opposing-member storage part capable of housing said opposing member;
and
an opposing-member conveying mechanism for holding said opposing member, moving said opposing member relative to said substrate holder between a first position and a second position in said up-down direction, and conveying said opposing member between a position above said substrate holder and said opposing-member storage part,
wherein said opposing member that is located at said first position is held by said opposing-member conveying mechanism and spaced above from said substrate holder, said opposing member that is located at said second position is held by said substrate holder and rotated along with said substrate holder by said substrate rotation mechanism,
said substrate processing method comprising:
a) conveying said opposing member from the position above said substrate holder into said opposing-member storage part;
and
b) conveying another opposing member housed in said opposing-member storage part out of said opposing-member storage part to the position above said substrate holder.

10 more elements

Dependencies are inferred from the claim text.