Mask data generation system, mask data generation method, and recording medium

A mask data generation method comprising:

• acquiring pattern contour data included in each of a plurality of layout candidate data for a first layer;
• acquiring pattern contour data included in layout data for a second layer;
• superimposing the contour data acquired for the first layer and the contour data acquired for the second layer with each other, for each of the plurality of layout candidate data;
• and
• calculating an overlap area between a first pattern in the contour data acquired for the first layer and a second pattern in the contour data acquired for the second layer, based on the superimposed data, for each of the plurality of layout candidate data.

A nontransitory computer readable recording medium that records a mask data generation program to be executed by a computer to generate data of a mask, so that the mask is to be used for forming a latent image on a photosensitive material through a projection optical system by irradiating the mask with illumination light from an illumination optical system,

• wherein the mask data generation program recorded therein, when executed, causes the computer to perform:
• acquiring pattern contour data included in each of a plurality of layout candidate data for a first layer;
• acquiring pattern contour data included in layout data for a second layer;
• superimposing the contour data acquired for the first layer and the contour data acquired for the second layer with each other, for each of the plurality of layout candidate data;
• and
• calculating an overlap area between a first pattern in the contour data acquired for the first layer and a second pattern in the contour data acquired for the second layer, based on the superimposed data, for each of the plurality of layout candidate data.