Reticle and fabrication method thereof, and method for fabricating patterns on a substrate
AssigneesXiamen Tianma Micro-Electronics Co., Ltd., Tianma Micro-Electronics Co., Ltd.
InventorsXIAOMIN LIU, LONG ZHANG, TING ZHOU, POPING SHEN
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Abstract
A reticle is provided. The reticle comprises a substrate having at least a first region and a second region; and an organic layer aligned in certain directions by an irradiation of a polarized UV light formed on a surface of the substrate. Wherein the organic layer in the first region has a first polarization direction; the organic layer in the second region has a second polarization direction; and the first polarization direction and the second polarization direction have a predetermined angle.
Claims20
A reticle, comprising:
- a substrate having at least a first region and a second region;
- and
- an organic layer aligned in certain directions by an irradiation of a polarized UV light formed on a surface of the substrate,
- wherein:
- the organic layer in the first region has a first polarization direction;
- the organic layer in the second region has a second polarization direction;
- and
- the first polarization direction and the second polarization direction have a predetermined angle.
A method for fabricating a reticle, comprising:
- providing a substrate having at least a first region and a second region;
- forming an organic layer on a surface of the substrate;
- disposing a first patterned mask exposing the first region and blocking the second region above the substrate having the organic layer;
- irradiating a polarized UV light to the first patterned mask to align the organic layer in the first region to have a first polarization direction;
- rotating the substrate with a first predetermined angle;
- disposing a second patterned mask exposing the second region and blocking the first region;
- and
- irradiating a polarized UV light to second patterned mask to align the organic layer in the second region to have a second polarization direction.
A method for fabricating patterns on a substrate, comprising:
- providing a substrate having a surface;
- forming a photoresist layer on the surface of the substrate;
- providing a metal optical grating and a reticle having at least two regions with polarization axis having different directions;
- irradiating a regular UV light from a side of the metal optical grating far away from the substrate;
- and
- developing the irradiated photoresist layer to form photoresist patterns with different thickness on the substrate.
Dependencies are inferred from the claim text.