US 2016/0238636 A1 · METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRAPHY APPARATUS

Abstract

A method for estimating a lifetime of a cathode in an electron beam lithography apparatus according to an embodiment, includes: calculating emittance of the cathode by using a lifetime reference value of the cathode; calculating an emitter lifetime diameter of the cathode by using the emittance; writing a pattern on a target object by using an electron beam emitted from the cathode; measuring emission current of the electron beam; calculating an emitter diameter by using the emission current; determining a regression formula of a change with time of the emitter diameter; and estimating the lifetime of the cathode by using the regression formula and the emitter lifetime diameter.

Claims7

Dependent claims

A method for estimating a lifetime of a cathode in an electron beam lithography apparatus, comprising:

calculating emittance of the cathode by using a lifetime reference value of the cathode;
calculating an emitter lifetime diameter of the cathode by using the emittance;
writing a pattern on a target object by using an electron beam emitted from the cathode;
measuring emission current of the electron beam;
calculating an emitter diameter by using the emission current;
determining a regression formula of a change with time of the emitter diameter;
and
estimating the lifetime of the cathode by using the regression formula and the emitter lifetime diameter.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/040,532Filed 10 Feb 2016

Priority

JP 2015-02743116 Feb 2015

Published

18 Aug 2016

Term ends

Not estimatedThe source records don’t support an estimate.

Classification11 codes

G01R 19/0061
Characterised by a specific application or detail not covered by any other subgroup of G01R19/00: measuring currents of particle-beams, currents…
H01J 37/243
Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for: beam current control or regulation circuits
H01J 37/304
Electron-beam or ion-beam tubes for localised treatment of objects: controlling tubes by information coming from the objects or from the beam,…
H01J 37/3174
For changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation: particle-beam lithography, e.g. electron…

Method for estimating lifetime of cathode in electron beam lithography apparatus

Life of this patent

Method for estimating lifetime of cathode in electron beam lithography apparatus

Life of this patent

Abstract

Claims7