Infrared sensor manufactured by method suitable for mass production
OwnerTetsuo TSUCHIYA, Susumu MIZUTA +3inventors
InventorsTetsuo TSUCHIYA, Susumu MIZUTA, Toshiya KUMAGAI, Tokuhito SASAKI, Seiji KURASHINA
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OwnerTetsuo TSUCHIYA, Susumu MIZUTA +3inventors
InventorsTetsuo TSUCHIYA, Susumu MIZUTA, Toshiya KUMAGAI, Tokuhito SASAKI, Seiji KURASHINA
Estimating the term…
An infrared sensor manufacturing method according to this invention includes a step of forming a bridge structure of an insulating material on an Si substrate, a step of forming a vanadium oxide thin film on the bridge structure by a dry film forming method, a step of irradiating laser light onto the vanadium oxide thin film to thereby change material properties thereof, a step of forming the vanadium oxide thin film with the changed material properties into a bolometer resistor having a predetermined pattern, and a step of forming a protective layer of an insulating material so as to cover the bolometer resistor having the predetermined pattern and the bridge structure.
A bolometer-type infrared sensor that changes a temperature of a light-incident portion thereof by absorption of incident infrared light so as to change an electrical resistance value of a resistor by a temperature change, thereby outputting a signal indicative of a radiation intensity of the incident infrared light, the method comprising:
Dependencies are inferred from the claim text.