Coating substrate using bernoulli atomic-layer deposition

A method for depositing a thin film on a moveable substrate using atmospheric pressure atomic-layer deposition, comprising:

• providing a chamber that includes a stationary support through which fluid can flow and which supports a moveable substrate;
• providing a moveable substrate that includes a levitation stabilizing structure on the moveable substrate that defines an enclosed interior impingement area of the moveable substrate;
• positioning the moveable substrate proximate to the stationary support so that the stationary support extends beyond the enclosed interior impingement area and the fluid flow is directed within the enclosed interior impingement area of the moveable substrate;
• and
• providing a fluid flow from a pressurized-gas source through the stationary support that impinges on the moveable substrate surface within the enclosed interior impingement area of the moveable substrate sufficient to levitate the moveable substrate and expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure to deposit a thin film on the moveable substrate.