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US 2016/0237559 A1Published application
Semiconductor manufacturing apparatus
AssigneeASM IP Holding B.V.
InventorNaoto TSUJI
Life of this patent
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Abstract
A semiconductor manufacturing apparatus includes a stage, and an exhaust duct having an annular passage surrounding a processing space over the stage, an annular slit through which a gas supplied to the processing space is led into the annular passage, and an exhaust port through which the gas in the annular passage is discharged to the outside, wherein the opening-area percentage of the slit is increased with increase in distance from the exhaust port.
Claims12
A semiconductor manufacturing apparatus comprising:
- a stage;
- and
- an exhaust duct having an annular passage surrounding a processing space over the stage, an annular slit through which a gas supplied to the processing space is led into the annular passage, and an exhaust port through which the gas in the annular passage is discharged to the outside,
- wherein the opening-area percentage of the slit is increased with increase in distance from the exhaust port.
1 more element
Dependencies are inferred from the claim text.