Apparatus for adjustable light source

A system for processing a substrate, comprising:

• a process chamber comprising an enclosure, the enclosure having an upper portion and a lower portion defining a processing region;
• a substrate support disposed in the processing region;
• a plurality of lamp modules connected to the upper portion for delivering radiation to the processing region;
• an adjustable bracket connected to at least one of the lamp modules;
• and
• an adjuster connected with the adjustable bracket, the adjuster providing a force for pivoting the adjustable bracket.

An apparatus for processing a semiconductor substrate, comprising:

• a plurality of radiation modules positioned in an upper portion of a process chamber, each radiation module comprising:
• a radiation source;
• a base connected to the radiation source;
• an adjustable bracket connected to the radiation source, the adjustable bracket comprising:
• a base connected to the radiation source;
• a first member comprising a first arm and a second arm, wherein the first arm is connected to the base;
• a second member connected to the first member by a pivot;
• and
• a spring connected between the second arm of the first member and the second member;
• and
• an adjuster connected with the first member to provide a pivoting force to the first member.