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US 2016/0108284 A1Published application
Polishing composition
AssigneeFujimi Incorporated
InventorYukinobu YOSHIZAKI
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Abstract
An object of the present invention is to provide a means for improving a polishing rate and polishing selectivity of a phase-change compound. The present invention is a polishing composition containing an organic compound having three or more hydroxy groups, at least one of an agent having a chelating action to at least one component of a phase-change compound and a brittle film forming agent, and an oxidizing agent.
Claims5
A polishing composition comprising:
- an organic compound having three or more hydroxy groups;
- at least one of an agent having a chelating action to at least one component of a phase-change compound and a brittle film forming agent;
- and
- an oxidizing agent.
1 more element
Dependencies are inferred from the claim text.