Fluid handling structure, a lithographic apparatus and a device manufacturing method

An immersion lithographic apparatus, the apparatus comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam on the substrate;
• and
• the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure:
• a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space, and
• a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature, wherein the plurality of gas supply openings are arranged to supply a substantially uniform flow of gas per unit length of the linear array.