Imprint apparatus, imprint method and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsYousuke Kondo, Toshinori Kobashi
Life of this patent
Estimating the term…
Abstract
An imprint apparatus include: a substrate stage; a dispense unit; an irradiation unit; a receiving unit configured to receive an imprint material that is dummy dispensed from the dispense unit; and a controller configured to cause the dummy dispensed imprint material to be irradiated by an energy beam from the irradiation unit without bringing the dummy dispensed imprint material into contact with the mold.
Claims16
An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus comprising:
- a substrate stage configured to hold the substrate;
- a dispense unit configured to dispense the imprint material on the substrate;
- an irradiation unit configured to irradiate an energy beam that cures the imprint material;
- a receiving unit configured to receive an imprint material that is dummy dispensed from the dispense unit;
- and
- a controller configured to cause the dummy dispensed imprint material to be irradiated by an energy beam from the irradiation unit without bringing the dummy dispensed imprint material into contact with the mold.
A method of manufacturing an article, the method comprising:
- forming a pattern on a substrate by using an imprint apparatus;
- and
- processing the substrate, on which the pattern has been formed, to manufacture the article,
- wherein the imprint apparatus comprises:
- a substrate stage configured to hold the substrate;
- a dispense unit configured to dispense the imprint material on the substrate;
- an irradiation unit configured to irradiate an energy beam that cures the imprint material;
- a receiving unit configured to receive an imprint material that is dummy dispensed from the dispense unit;
- and
- a controller configured to cause the dummy dispensed imprint material to be irradiated by an energy beam from the irradiation unit without bringing the dummy dispensed imprint material into contact with the mold.
An imprint method of forming a pattern of an imprint material on a substrate by bringing the imprint material into contact with a mold, the imprint method comprising:
- dummy dispensing the imprint material onto a receiving unit different from the substrate on which the pattern is formed;
- forming the pattern of the imprint material on the substrate after the dummy dispensing;
- and
- curing the dummy dispensed imprint material without bringing the dummy dispensed imprint material into contact with the mold, before the pattern forming.
An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus comprising:
- a dispense unit configured to dispense the imprint material on the substrate;
- a receiving unit different from the substrate on which a pattern is formed and configured to receive the imprint material dummy dispensed from the dispense unit;
- and
- a curing unit configured to cure the imprint material dispensed onto the receiving unit without bringing the imprint material dispensed onto the receiving unit into contact with the mold.
An imprint method of forming a pattern of an imprint material on a substrate by using a mold, the imprint method comprising:
- dummy dispensing the imprint material onto a receiving unit different from the substrate on which the pattern is formed;
- and
- curing the imprint material dummy dispensed onto the receiving unit.
Dependencies are inferred from the claim text.