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US 2015/0371834 A1Published application
Apparatus and Methods for Defining a Plasma
AssigneeCAMVAC Limited
InventorsDavid Anthony, John Topping
Life of this patent
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Abstract
Apparatus comprising: a support arranged to transport a moving substrate; a plasma generator arranged to generate plasma; and an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux. The ion flux has an energy level between 3.6 eV and 250 eV. Alternatively, apparatus for defining plasma having a plurality of spaced race track portions.
Claims26
An apparatus comprising:
- a support arranged to transport a moving substrate;
- a plasma generator arranged to generate plasma;
- an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux, wherein the ion flux has an energy level between 3.6 eV and 250 eV.
A method comprising:
- providing a moving substrate;
- generating a plasma;
- and
- biasing ions within the plasma towards the moving substrate to form an ion flux, the ion flux having an energy level between 3.6 eV and 250 eV.
1 more element
An apparatus comprising:
- a drum arranged to transport a moving substrate;
- a plasma generator arranged to generate a plasma;
- and
- a magnet array arranged to define a magnetic field configured to influence the generated plasma to form:
- a first race track portion that is adjacent to a first surface region of the drum;
- and
- a second race track portion that is adjacent to a second surface region of the drum, wherein the first and second surface regions are circumferentially spaced from one another.
4 more elements
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26-28. (canceled)
Dependencies are inferred from the claim text.