Oxidation process apparatus, oxidation method, and method for manufacturing electronic device

An oxidation process apparatus for performing an oxidation process on a substrate comprising:

• a processing chamber;
• a substrate holder provided in the processing chamber and having a substrate holding surface for holding the substrate;
• an oxygen gas introduction means for introducing an oxygen gas into the processing chamber;
• a surrounding portion provided in the processing chamber;
• and
• a position changing means for changing relative positions of the substrate holder and the surrounding portion to allow the substrate holding surface and the surrounding portion to form a space,
• wherein the surrounding portion is provided so as to, during formation of the space, surround a side surface of the substrate holder and form a gap between the surrounding portion and the substrate holder,
• wherein the oxygen gas introduction means is provided so as to, during the oxidation process, introduce the oxygen gas restrictively into the space formed in the processing chamber,
• wherein the substrate holder comprises a dielectric portion having the substrate holding surface, a groove portion formed in the substrate holding surface, and a means for introducing at least one of a heating gas and a cooling gas into a second space formed in the groove portion between the substrate and the dielectric portion, when the substrate is held on the substrate holding surface, and
• wherein the oxygen gas introduced into the space and the at least one of the heating gas and the cooling gas introduced into the second space are evacuated from the space and the second space through the gap.