Substrate processing apparatus, substrate detection method of substrate processing apparatus and storage medium
AssigneeTokyo Electron Limited
InventorsKento Kurusu, Kohei Mori
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AssigneeTokyo Electron Limited
InventorsKento Kurusu, Kohei Mori
Estimating the term…
A liquid processing apparatus includes a substrate holding and rotating unit provided with a rotating plate and a substrate support unit, and a liquid supply unit. The rotating plate is connected to a rotating shaft and a central portion of the rotating shaft is exposed to outside through an opening of the rotating plate. A ring-shaped retro-reflective sheet is attached to the central portion of the rotating shaft. The central opened part of the ring-shaped retro-reflective sheet is positioned on the extended line of the central axis of the wafer holding and rotating unit. Further, a supply pipe penetrates through the central opened part of the retro-reflective sheet. Laser light is irradiated to the retro-reflective sheet from the slanted upper side, the reflected light is received by the laser light projecting/receiving part, and presence or absence of the wafer is detected by a substrate detection unit.
A substrate processing apparatus comprising:
A substrate detection method of a substrate processing apparatus, where the substrate processing apparatus includes:
A computer-readable storage medium storing a computer executable program that, when executed, causes a computer to perform a substrate detection method of a substrate processing apparatus, where the substrate processing apparatus includes:
Dependencies are inferred from the claim text.