Transparent conductive glass substrate with surface electrode, method for producing same, thin film solar cell, and method for manufacturing thin film solar cell

A thin film solar cell, comprising:

• a transparent conductive glass substrate with a surface electrode, the transparent conductive glass substrate being configured such that, on a translucent glass substrate, a low-refractive-index transparent thin film having a refractive index of 1.6 to 1.8 at a wavelength of 550 nm and having a film thickness of 50 nm to 150 nm is formed as a first layer, and, on the low-refractive-index transparent thin film, an amorphous indium-oxide-based transparent conductive film as a second layer and a rough film made of a crystalline zinc-oxide-based transparent conductive film as a third layer are formed in that order;
• a photoelectric conversion semiconductor layer;
• and
• a back surface electrode including at least a light reflective metal electrode,
• wherein the transparent conductive glass substrate with a surface electrode, the photoelectric conversion semiconductor layer, and the back surface electrode are formed in that order.

A method for manufacturing a thin film solar cell, the thin film solar cell comprising:

• a transparent conductive glass substrate with a surface electrode;
• a photoelectric conversion semiconductor layer;
• and a back surface electrode including at least a light reflective metal electrode, wherein the transparent conductive glass substrate, the photoelectric conversion semiconductor layer, and the back surface electrode are formed in that order,
• the method including a step of forming the transparent conductive glass substrate with the surface electrode,
• the step comprising:
• a low-refractive-index transparent thin film formation step, wherein, on a translucent glass substrate, a low-refractive-index transparent thin film having a refractive index of 1.6 to 1.8 at a wavelength of 550 nm and having a film thickness of 50 nm to 150 nm is formed as a first layer by sputtering;
• and
• a surface electrode formation step, wherein, on the low-refractive-index transparent thin film, with a temperature of the translucent glass substrate being maintained in a range of not less than a room temperature and not more than 50° C., an amorphous indium-oxide-based transparent conductive film is formed as a second layer by sputtering, and then, with a temperature of the translucent glass substrate being maintained in a range of 250° C. to 400° C., a rough film made of a crystalline zinc-oxide-based transparent conductive film is formed as a third layer by sputtering.