Thin film transistor array substrate and manufacturing method thereof, and display device

Abstract

A thin film transistor array substrate and a manufacturing method thereof, and a display device comprising the thin film transistor array substrate, including a gate electrode (4) within a gate electrode recess of a first insulating layer (2), so that the gate electrode (4) is surrounded by the first insulating layer (2), the patterned gate electrode (4) has no slope, and the first insulating layer (2) isolates the gate electrode (4) from the outside, which can prevent fracture of the gate insulating layer (5), and further effectively block copper diffusion in the thin film transistor array substrate. Further, the metal blocking layer completely covers an upper surface and/or a lower surface of the composite copper metal or the composite thin film layer including copper metal, which can play a good role in blocking copper diffusion; meanwhile, above all, it is not necessary to etch copper, which reduces cost and improves yield.

Dependencies are inferred from the claim text.