Non-Volatile Semiconductor Storage Device
AssigneeFloadia Corporation
InventorsYasuhiro Taniguchi, Kosuke Okuyama
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AssigneeFloadia Corporation
InventorsYasuhiro Taniguchi, Kosuke Okuyama
Estimating the term…
To propose a non-volatile semiconductor memory device capable of injecting charge into a floating gate by source side injection even in a single-layer gate structure. In a non-volatile semiconductor memory device (1), while each of the memory transistor (MGA1) and the switch transistor (SGA) is made to have a single-layer gate structure, when a selected memory cell (3a) is turned on by applying a high voltage to one end of a memory transistor (MGA1) from a source line (SL) during data programming and applying a low voltage to one end of the switch transistor (SGA) from a bit line (BL1), a voltage drop occurs in a low-concentration impurity extension region (ET2) in the memory transistor (MGA1) between the source line (SL) and the bit line (BL1) to generate an intense electric field, and charge can be injected into the floating gate (FG) by source side injection using the intense electric field.
A non-volatile semiconductor memory device comprising a memory cell including a memory transistor having a single-layer gate structure having a floating gate and a switch transistor having a single-layer gate structure having a switch gate electrode, wherein
Dependencies are inferred from the claim text.