Method and apparatus for optical proximity correction

An integrated circuit (IC) design method, comprising:

• receiving a first layout comprising stripe patterns with a first separation and a first width;
• receiving a second layout comprising stripe patterns with a second width narrower than the first separation, wherein each stripe of the stripe patterns on the second layout is configured to situate between two adjacent stripes of the stripe patterns on the first layout when overlaying the first layout and the second layout;
• performing a separation check by identifying a spacing between a stripe on the second layout and one of the two adjacent stripes on the first layout;
• and
• increasing the second width of the stripe on the second layout when the separation check determining the spacing is greater than a predetermined value.

An integrated circuit (IC) design system, comprising:

• a processor;
• a communication module communicatively coupled to the processor and configured to receive a first layout comprising stripe patterns with a first separation and a first width and a second layout comprising stripe patterns with a second width narrower than the first separation;
• and
• a non-transitory, computer-readable storage communicatively coupled to the processor and including instructions executable by the processor, the instructions including:
• instruction to overlay the first layout and the second layout;
• instruction to perform a separation check by identifying a spacing between a stripe of the stripe patterns on the second layout and one of two adjacent stripes of the stripe patterns on the first layout, wherein each stripe on the second layout is configured to situate between the two adjacent stripes on the first layout when overlaying the first layout and the second layout;
• and
• instruction to increase the second width of the stripe on the second layout when the separation check determining the spacing is greater than a predetermined value.