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US 2015/0309420 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcel BECKERS, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Abstract
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Claims20
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a barrier member having a surface surrounding a space between the projection system and the substrate table, the barrier member being configured to at least partly confine a liquid in the space, the barrier member comprising a liquid inlet configured to provide liquid to the space and a liquid outlet configured to remove liquid from the space, wherein the liquid inlet and/or the liquid outlet extends around a fraction of the inner periphery of the surface.
1 more element
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a barrier member having a surface surrounding a space between a final element of the projection system and the substrate table, the barrier member being configured to contain a liquid in the space between the final element and the substrate, the barrier member comprising a liquid inlet configured to provide liquid to the space, the inlet comprising a chamber in the barrier member separated from the space by a plate member, the plate member forming at least part of the surface and having a plurality of through holes extending between the chamber and the space for the flow of liquid therethrough.
1 more element
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide liquid to a space between a final element of the projection system and a substrate,
- wherein the liquid supply system comprises an extractor configured to remove liquid from the space, the extractor comprising a two dimensional array of orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.
2 more elements
Dependencies are inferred from the claim text.