Method and tool of lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsung-Pao CHEN, Sheng-Min CHUANG, Teng-Kuei CHUANG
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Abstract
A tool and a method of lithography are provided. In various embodiments, the method of lithography includes forming a photoresist layer on a substrate. The method further includes exposing the photoresist layer to form an exposed photoresist layer. The method further includes rinsing the exposed photoresist layer. The method further includes treating the exposed photoresist layer with a chemical modifier to form a modified photoresist layer. The method further includes baking the modified photoresist layer. The method further includes developing the modified photoresist layer.
Claims21
A method of lithography, the method comprising:
- forming a photoresist layer on a substrate;
- exposing the photoresist layer to form an exposed photoresist layer;
- rinsing the exposed photoresist layer;
- treating the exposed photoresist layer with a chemical modifier to form a modified photoresist layer;
- baking the modified photoresist layer;
- and
- developing the modified photoresist layer.
A method of lithography, the method comprising:
- forming a photoresist layer on a substrate, wherein the photoresist layer has a photo acid generator;
- exposing the photoresist layer to form an exposed photoresist layer, wherein the exposed photoresist layer has photo acids generated by the photo acid generator;
- rinsing the exposed photoresist layer;
- and
- treating the exposed photoresist layer with a chemical modifier to form a modified photoresist layer,
- wherein a distribution profile of the photo acids in the exposed photoresist layer produced in the exposing of the photoresist layer is modified by the chemical modifier in the treating of the exposed photoresist layer, and the distribution profile of the photo acids in the exposed photoresist layer is modified into a modified distribution profile of the photo acids in the modified photoresist layer.
18-20. (canceled)
Dependencies are inferred from the claim text.