Pellicle structure and method for forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYun-Yue LIN, Chia-Jen CHEN, Hsin-Chang LEE, Anthony YEN
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Abstract
A pellicle structure, a pellicle-mask structure, and a method for forming the pellicle structure are provided. The pellicle structure includes a pellicle film made of a carbon-based material. In addition, the pellicle film is configured to protect a mask structure in a lithography process. The pellicle-mask structure includes a mask substrate having a mask pattern formed over the mask substrate and the pellicle frame disposed on the mask substrate. The pellicle-mask structure further includes the pellicle film disposed on the pellicle frame.
Claims20
A pellicle structure, comprising:
- a pellicle film made of a carbon-based material, wherein the pellicle film is configured to protect a mask structure in a lithography process.
A pellicle-mask structure, comprising:
- a mask substrate having a mask pattern formed over the mask substrate;
- a pellicle frame disposed on the mask substrate;
- and
- a pellicle film disposed on the pellicle frame, wherein the pellicle film is made of a carbon-based material.
A method for forming a pellicle structure, comprising:
- forming a metal layer over a substrate;
- forming a pellicle film made of a carbon-based material over the metal layer;
- forming a polymer layer over the pellicle film;
- removing the metal layer and the substrate from the pellicle film;
- attaching a pellicle frame to the pellicle film;
- and
- removing the polymer layer.
Dependencies are inferred from the claim text.