Methods for Rapid Generation of ALD Saturation Curves Using Segmented Spatial ALD

A method, comprising:

• a) introducing a substrate having a plurality of substrate segment regions defined thereon into a processing chamber;
• b) sequentially exposing a first plurality of the substrate segment regions to a precursor within the processing chamber, wherein the substrate is held at the first processing temperature;
• c) sequentially exposing the first plurality of substrate segment regions to a reactant, wherein the substrate is held at the first processing temperature;
• d) repeating steps b) and c) for a plurality of cycles, thereby forming a first plurality of films;
• e) sequentially exposing a second plurality of the substrate segment regions to the precursor within the processing chamber, wherein the substrate is held at a second processing temperature;
• f) sequentially exposing the second plurality of substrate segment regions to a reactant, wherein the substrate is held at the second processing temperature;
• g) repeating steps e) and f) for a plurality of cycles, thereby forming a second plurality of films;
• h) sequentially exposing a third plurality of the substrate segment regions to the precursor within the processing chamber, wherein the substrate is held at a third processing temperature;
• i) sequentially exposing the third plurality of substrate segment regions to a reactant, wherein the substrate is held at the third processing temperature;
• and
• j) repeating steps h) and i) for a plurality of cycles, thereby forming a third plurality of films.