Polishing Material Composition And Production Method Therefor
AssigneeKonica Minolta, Inc.
InventorsNatsuki Ito, Atsushi Takahashi, Akihiro Maezawa
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AssigneeKonica Minolta, Inc.
InventorsNatsuki Ito, Atsushi Takahashi, Akihiro Maezawa
Estimating the term…
An abrasive composition to be used in an abrasive material, including an inorganic abrasive particle. The particle comprises a shell layer being an outermost layer and mainly composed of cerium oxide; and an intermediate layer comprising cerium oxide and an oxide of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and alkali earth metals and formed on an inner side of the shell layer. The abrasive composition also includes an organic base member comprising a polymerizable compound, wherein an outer surface of the organic base member is covered with the inorganic abrasive particle.
An abrasive composition to be used in an abrasive material, comprising:
A method of producing an abrasive composition, comprising:
Dependencies are inferred from the claim text.