Laminated polishing pad and method for manufacturing same

Abstract

The purpose of the present invention is to provide a method for manufacturing a laminated polishing pad in which a polishing layer and a support layer resist delamination even when heated to high temperature due to long-time polishing, and the support layer is less likely to wrinkle. This method for manufacturing a laminated polishing pad, comprising the steps of: preparing a laminate comprising a polishing layer, a support layer, and a hot-melt adhesive member placed between the polishing layer and the support layer; and allowing the laminate to pass between a pair of lamination rolls so that the polishing layer and the support layer are bonded with the hot-melt adhesive member to form a laminated polishing sheet, wherein in the laminate, the ratio TD1 (TD length of the polishing layer)/TD2 (TD length of the support layer) is constantly adjusted to 0.3 or more.

Dependencies are inferred from the claim text.