Ophthalmic apparatus, and treatment site measuring method for the apparatus
AssigneeLutronic Corporation
InventorsTae Ho Ha, Ki Chan Kim
Life of this patent
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AssigneeLutronic Corporation
InventorsTae Ho Ha, Ki Chan Kim
Estimating the term…
The present invention relates to an ophthalmic apparatus and to a treatment site measuring method for the apparatus. The ophthalmic apparatus according to the present invention comprises: a first image unit for capturing the lower region of a retina so as to generate an image of the captured retina; a second image unit for capturing the local region of the retina indicated by a surgical operator so as to generate an image of the captured local region of the retina; and a control unit for mapping the image of the local region of the retina generated by the second image unit to the image of the retina generated by the first image unit based on the image of the retina generated by the first image unit.
An ophthalmic apparatus measuring a treatment location of a retina, comprising:
A method of measuring, by an ophthalmic apparatus measuring a treatment location of a retina, a treatment location, the method comprising steps of:
Dependencies are inferred from the claim text.