Loading patent…
AssigneesNippon Kayaku Kabushiki Kaisha, Polatechno Co., Ltd.
InventorsYoshihiko Taira, Ryota Nakashima
Estimating the term…
[Problem] To provide: a photosensitive resin composition which is cured by radiation and exhibits excellent wear resistance, antifouling properties, marker pen ink wiping-off properties, fingerprint wiping-off properties and low refractive index, and which provides low reflectance in cases where the photosensitive resin composition is used for an antireflection film; and an antireflection film which has a cured coating film of this photosensitive resin composition. [Solution] A photosensitive resin composition for an antireflection film that is characterized in that a low refractive index layer contains an acrylate, a colloidal silica, and an organic modified dimethyl polysiloxane having an acryloyl group and an acrylate-modified perfluoropolyether that serve as surface modification agents; and an antireflection film which is obtained by curing the photosensitive resin composition.
A photosensitive resin composition for an antireflection film, comprising a polyfunctional (meth)acrylate having at least three (meth)acryloyl groups in the molecule, colloidal silica, and an organic modified dimethylpolysiloxane having an acryloyl group and an acrylate-modified perfluoropolyether as surface modifying agents.
An antireflection film comprising a substrate film, a hard coat layer, and a low refractive index layer wherein the hard coat layer and the low refractive index layer are laminated sequentially on the substrate film and the low refractive index layer has a refractive index lower than the hard coat layer.
Dependencies are inferred from the claim text.